Paper highlight: Nanoscopic patterned materials with tunable dimensions: "Their approach combines block copolymer self-assembly with the self-limiting and selective process of atomic layer deposition.
By choosing suitable polymer and deposition precursor chemistries, highly selective deposition can be achieved in which the inorganic material grows within only one of the polymer blocks.
Through rational design of block copolymers and selection of deposition parameters, patterned designer materials with controlled size, spacing, symmetry, and composition can be synthesized."
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